A laser-plasma clean soft X-ray source for projection microlithography

S. Bollanti, P. Di Lazzaro, F. Flora, L. Mezi, D. Murra, A. Torre

Research output: Contribution to conferencePaper

3 Citations (Scopus)

Abstract

Within a National Project on nanotechnologies, at the ENEA Research Centre in Frascati a micro-exposure tool for projection lithography at 14.4 nm has been developed. The laser-plasma soft X-ray source is equipped with a patented debris mitigation system developed in the frame of a European Integrated Project, in order to preserve the collecting optics. A 90-nm-resolution patterning has been achieved on resist by this laboratory-scale tool based on a Schwarzschildtype projection optics. © 2009 SPIE.
Original languageEnglish
DOIs
Publication statusPublished - 2009
Externally publishedYes
EventXVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers - , Portugal
Duration: 1 Jan 2009 → …

Conference

ConferenceXVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers
CountryPortugal
Period1/1/09 → …

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All Science Journal Classification (ASJC) codes

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Bollanti, S., Lazzaro, P. D., Flora, F., Mezi, L., Murra, D., & Torre, A. (2009). A laser-plasma clean soft X-ray source for projection microlithography. Paper presented at XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, Portugal. https://doi.org/10.1117/12.816912