A step towards accreditation: A robustness test of etching process

F. Leonardi, M. Veschetti, S. Tonnarini, F. Cardellini, R. Trevisi

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

In the present study the robustness of the etching process used by our laboratory was assessed. The strategy followed was based on the procedure suggested by Youden. Critical factors for the process were estimated using both Lenth's method and Dong's algorithm. The robustness test evidences that particular attention needs to be paid to the control of the etching solution's temperature.
Original languageEnglish
Pages (from-to)93 - 97
Number of pages5
JournalApplied Radiation and Isotopes
Volume102
DOIs
Publication statusPublished - 1 Aug 2015
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Radiation

Cite this

Leonardi, F., Veschetti, M., Tonnarini, S., Cardellini, F., & Trevisi, R. (2015). A step towards accreditation: A robustness test of etching process. Applied Radiation and Isotopes, 102, 93 - 97. https://doi.org/10.1016/j.apradiso.2015.05.002