AZO films prepared by r.f. magnetron sputtering: Structural, electrical, and optical properties

Maria Luisa Grilli, Anna Krasilnikova Sytchkova, Sylvia Boycheva, Angela Piegari

Research output: Contribution to conferencePaper

1 Citation (Scopus)

Abstract

Aluminium-doped zinc oxide films with 91% transmittance in the visible range and electrical resistivity of the order of 10-3Ωcm were fabricated by radio frequency magnetron sputtering in Ar atmosphere starting from a target of ZnO mixed with 2% wt Al2O3. A systematic study of the deposition conditions such as substrate temperature, working gas pressure, radio frequency power, magnetron strength, target to substrate distance, etc., was performed when searching for improved electrical and optical performances of the films. Several deposition conditions govern the film characteristics, so that films with same good optical and electrical properties can be obtained by opportunely combining different deposition parameters. © 2008 SPIE.
Original languageEnglish
DOIs
Publication statusPublished - 2008
EventAdvances in Optical Thin Films III - , United Kingdom
Duration: 1 Jan 2008 → …

Conference

ConferenceAdvances in Optical Thin Films III
CountryUnited Kingdom
Period1/1/08 → …

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Grilli, M. L., Krasilnikova Sytchkova, A., Boycheva, S., & Piegari, A. (2008). AZO films prepared by r.f. magnetron sputtering: Structural, electrical, and optical properties. Paper presented at Advances in Optical Thin Films III, United Kingdom. https://doi.org/10.1117/12.797665