Background gas density and beam losses in NIO1 beam source

E. Sartori, P. Veltri, M. Cavenago, G. Serianni

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

NIO1 (Negative Ion Optimization 1) is a versatile ion source designed to study the physics of production and acceleration of H- beams up to 60 keV. In ion sources, the gas is steadily injected in the plasma source to sustain the discharge, while high vacuum is maintained by a dedicated pumping system located in the vessel. In this paper, the three dimensional gas flow in NIO1 is studied in the molecular flow regime by the Avocado code. The analysis of the gas density profile along the accelerator considers the influence of effective gas temperature in the source, of the gas temperature accommodation by collisions at walls, and of the gas particle mass. The calculated source and vessel pressures are compared with experimental measurements in NIO1 during steady gas injection.
Original languageEnglish
Article number02B118
Pages (from-to)-
JournalReview of Scientific Instruments
Volume87
Issue number2
DOIs
Publication statusPublished - 1 Feb 2016
Externally publishedYes

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Instrumentation

Cite this

Sartori, E., Veltri, P., Cavenago, M., & Serianni, G. (2016). Background gas density and beam losses in NIO1 beam source. Review of Scientific Instruments, 87(2), -. [02B118]. https://doi.org/10.1063/1.4932976