Boronization with trimethylboron in the reversed field pinch RFX

P. Sonato, V. Antoni, W.R. Baker, R. Bertoncello, A. Buffa, L. Carraro, S. Costa, G. Della Mea, L. Marrelli, A. Murari, M.E. Puiatti, V. Rigato, P. Scarin, L. Tramontin, M. Valisa, S. Zandolin

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Abstract

The first wall and the vessel of the Reversed Field Pinch RFX has been in situ coated with a B/C:H film by glow discharge cleaning with a mixture of 12.5% of trimethylboron ((CH3)3B) in He. The film has been analysed and the effects on the plasma discharges of the boronized wall are reported for a plasma current of 520 kA. The main effects on the plasma are a reduction in the oxygen content, by a factor of 5 to 10 and a decrease in the carbon content by a factor of two. The Zeffhas been reduced from 2-2.5 to 1.4-1.5. A slight reduction of the loop voltage is observed. The radiation power decreases by a factor of 2, enhancing the high density operation limit with a consequent increase of the poloidal beta βθ and of the energy confinement time τE.
Original languageEnglish
Pages (from-to)259 - 265
Number of pages7
JournalJournal of Nuclear Materials
Volume227
Issue number3
DOIs
Publication statusPublished - 1996
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Materials Science(all)
  • Nuclear Energy and Engineering

Cite this

Sonato, P., Antoni, V., Baker, W. R., Bertoncello, R., Buffa, A., Carraro, L., ... Zandolin, S. (1996). Boronization with trimethylboron in the reversed field pinch RFX. Journal of Nuclear Materials, 227(3), 259 - 265. https://doi.org/10.1016/0022-3115(95)00161-1