Broad-band active channels induced by electron beam lithography in LiF films for waveguiding devices

R.M. Montereali, S. Bigotta, M. Piccinini, M. Giammatteo, P. Picozzi, S. Santucci

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Abstract

For the first time, a confocal light scanning microscope (CLSM) in fluorescence mode was used to reconstruct the depth distribution of efficiently emitting laser-active color centers (CCs) in a stripe-like region induced by 12 keV electrons on lithium fluoride (LiF) films thermally evaporated on glass. The formation of the F3+and F2aggregate defects appears restricted to the electron penetration and proportional to their energy depth profile, as obtained from a Monte Carlo simulation.
Original languageEnglish
Pages (from-to)764 - 770
Number of pages7
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume166
DOIs
Publication statusPublished - 2 May 2000
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Instrumentation

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