Carbon structures grown by direct current microplasma: Diamonds, single-wall nanotubes, and graphene

Francesco Ghezzi, Gabriele Cacciamani, Roberto Caniello, Dana Cristina Toncu, Federica Causa, David Dellasega, Valeria Russo, Matteo Passoni

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10 Citations (Scopus)


Plasma assisted CVD is now an established technique for the growth of a variety of dielectrics and semiconductors. The versatility of an in-house developed direct-current (dc) microplasma deposition system is demonstrated here for the growth of a wide range of carbon-based materials. Diamond, nanodiamond, nanocrystalline graphite, single-wall carbon nanotubes, and few-layer graphene have been deposited using the same dc microplasma deposition system using 0.5% CH4/H2 gas feed, but changing only the substrate temperature (in the range 500-1150°C) and the total pressure (0.3-200 Torr). The different structures have been characterized by scanning electron microscopy and micro-Raman spectroscopy. The experimental data have been interpreted from a thermodynamic point of view by applying a nonequilibrium nondissipative model. Nonequilibrium phase diagrams are presented and compared to the experimental data to provide a wide-ranging interpretation scenario.
Original languageEnglish
Pages (from-to)24714 - 24722
Number of pages9
JournalJournal of Physical Chemistry C
Issue number42
Publication statusPublished - 23 Oct 2014
Externally publishedYes


All Science Journal Classification (ASJC) codes

  • Physical and Theoretical Chemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Energy(all)

Cite this

Ghezzi, F., Cacciamani, G., Caniello, R., Toncu, D. C., Causa, F., Dellasega, D., Russo, V., & Passoni, M. (2014). Carbon structures grown by direct current microplasma: Diamonds, single-wall nanotubes, and graphene. Journal of Physical Chemistry C, 118(42), 24714 - 24722.