Plasma assisted CVD is now an established technique for the growth of a variety of dielectrics and semiconductors. The versatility of an in-house developed direct-current (dc) microplasma deposition system is demonstrated here for the growth of a wide range of carbon-based materials. Diamond, nanodiamond, nanocrystalline graphite, single-wall carbon nanotubes, and few-layer graphene have been deposited using the same dc microplasma deposition system using 0.5% CH4/H2 gas feed, but changing only the substrate temperature (in the range 500-1150°C) and the total pressure (0.3-200 Torr). The different structures have been characterized by scanning electron microscopy and micro-Raman spectroscopy. The experimental data have been interpreted from a thermodynamic point of view by applying a nonequilibrium nondissipative model. Nonequilibrium phase diagrams are presented and compared to the experimental data to provide a wide-ranging interpretation scenario.
All Science Journal Classification (ASJC) codes
- Physical and Theoretical Chemistry
- Electronic, Optical and Magnetic Materials
- Surfaces, Coatings and Films
Ghezzi, F., Cacciamani, G., Caniello, R., Toncu, D. C., Causa, F., Dellasega, D., Russo, V., & Passoni, M. (2014). Carbon structures grown by direct current microplasma: Diamonds, single-wall nanotubes, and graphene. Journal of Physical Chemistry C, 118(42), 24714 - 24722. https://doi.org/10.1021/jp501440b