Characterisation of antireflective TiO

C. Battaglin, F. Caccavale, A. Menelle, M. Montecchi, E. Nichelatti, F. Nicoletti, P. Polato

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Abstract

Reactive magnetron sputtering deposition processes based on rotating or double cathodes allow the deposition of multiple TiO2//SiO2layers on glass for obtaining antireflective coatings for large area applications with a good homogeneity and high resistance against environmental attacks. By increasing the number of TiO2//SiO2layers, the luminous reflectance of the coated glass decreases but the calculation of angular daylight and energy parameters requires the use of an increasing number of complementary analytical techniques due to the complexity of the coating. In this paper we show how Rutherford back-scattering, neutron reflectivity and spectrophotometry can be successfully utilised to perform a quite complete characterisation of commercial antireflective coatings based on three TiO2//SiO2layers. © 1999 Elsevier Science S.A. All rights reserved.
Original languageEnglish
Pages (from-to)176 - 179
Number of pages4
JournalThin Solid Films
Volume351
Issue number1-2
DOIs
Publication statusPublished - 30 Aug 1999

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Battaglin, C., Caccavale, F., Menelle, A., Montecchi, M., Nichelatti, E., Nicoletti, F., & Polato, P. (1999). Characterisation of antireflective TiO. Thin Solid Films, 351(1-2), 176 - 179. https://doi.org/10.1016/S0040-6090(99)00212-6