Defect generation in low-energy ion-assisted thermal deposited lithium fluoride films

A. Cricenti, R.M. Montereali, V. Mussi, E. Nichelatti, L. Pilloni, S. Scaglione, F. Somma

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Abstract

We present first results concerning stable formation of primary electronic defects and lithium nanometer sized clusters in LiF thin films grown by ion-assisted thermal deposition. The optical and morphological properties of the as grown LiF films, dependent on the deposition conditions, such as ion-beam energy and ion species (Xe, Ar), are reported. The experimental results show a larger efficiency of low-energy Xe ions in inducing the formation of lithium nano-clusters. To analyse the role of the deposition conditions, a preliminary interpretation of the lithium nano-cluster formation mechanism based on the spherical and/or cylindrical spike thermal model is given. © 2003 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)111 - 116
Number of pages6
JournalJournal of Non-Crystalline Solids
Volume322
Issue number1-3
DOIs
Publication statusPublished - 15 Jul 2003

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All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

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