Deposition and properties of ZrN

A. Rizzo, M. A. Signore, L. Mirenghi, D. Dimaio

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Abstract

Thin ZrNxfilms have been prepared by reactive radio frequency magnetron sputtering. The radio frequency power has been chosen as a sputtering parameter and the effect on the compositional and optical properties of the films was systematically studied. The films have been analyzed by X-ray photoelectron spectroscopy. The reflectance and transmittance of the samples have been recorded by a spectrophotometer in the UV-Vis-IR range. The effects of the different powers (in the range 100-400 W) on the stoichiometry of ZrNxfilms have been studied. The components revealed on N 1s photoelectron peaks were correlated with different bounding states for the zirconium nitride. The threshold power value between N-rich ZrNxfilms and Zr-rich ZrNxones is 270 W. A correlation has been observed between the optical properties and the stoichiometry of the films. In fact, the samples catalogued as N-rich by X-ray photoelectron spectroscopy analyses are optically insulating and the Zr-rich ones show a metallic behaviour. A simple growth model has been set up in order to explain the different chemical states detected from the compositional measurements. © 2006 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)1486 - 1493
Number of pages8
JournalThin Solid Films
Volume515
Issue number4
DOIs
Publication statusPublished - 5 Dec 2006
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Rizzo, A., A. Signore, M., Mirenghi, L., & Dimaio, D. (2006). Deposition and properties of ZrN. Thin Solid Films, 515(4), 1486 - 1493. https://doi.org/10.1016/j.tsf.2006.04.012