Electron density control using fast gas puffing in reversed-field pinch device, TPE-RX

Hajime Sakakita, Yasuyuki Yagi, Haruhisa Koguchi, Yoichi Hirano, Toshio Shimada, Alessandra M. Canton, Paolo Innocente

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Electron density is scanned using fast gas puffing in the reversed-field pinch (RFP) device, TPE-RX. The gas puffing technique extends the operating range of IP/N from 12 to 2 × 10-14Am (IPand N denote the plasma current and line density, respectively). It is estimated that the poloidal beta, βP, increases as IP/N decreases.This βPscaliing as IP/N in TPE-RX confirms a similar tendency previously obtained in other RFP plasmas. The radiation fraction increases from ∼20% in the low-density regime to ∼35% in the highest-density regime. This result indicates that the lowest IP/N limit in RFP is similar to the density limit in tokamak plasmas.
Original languageEnglish
Pages (from-to)-
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume43
Issue number9 AB
DOIs
Publication statusPublished - 15 Sep 2004
Externally publishedYes

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Sakakita, H., Yagi, Y., Koguchi, H., Hirano, Y., Shimada, T., Canton, A. M., & Innocente, P. (2004). Electron density control using fast gas puffing in reversed-field pinch device, TPE-RX. Japanese Journal of Applied Physics, Part 2: Letters, 43(9 AB), -. https://doi.org/10.1143/JJAP.43.L1184