Within a National Project on nanotechnologies (EUVL-FIRB), aimed at developing the Italian know-how in all aspects of EUV lithography, through the realization at the Frascati ENEA Center of a Micro-Exposure Tool (MET) for EUVL with a <100nm resolution, an EUV-Soft X-ray laser plasma source has been realized and a composite Debris Mitigation System (DMS) has been designed and partly implemented. Both the source and the DMS are shortly described.
|Publication status||Published - 2007|
|Event||34th European Physical Society Conference on Plasma Physics 2007, EPS 2007 - , Poland|
Duration: 1 Jan 2007 → …
|Conference||34th European Physical Society Conference on Plasma Physics 2007, EPS 2007|
|Period||1/1/07 → …|
All Science Journal Classification (ASJC) codes
- Atomic and Molecular Physics, and Optics
Bollanti, S., Conti, A., Di Lazzaro, P., Flora, F., Mezi, L., Murra, D., ... Zheng, C. (2007). EUV lithography based on laser-plasma sources and debris mitigation: Recent developments at ENEA. Paper presented at 34th European Physical Society Conference on Plasma Physics 2007, EPS 2007, Poland.