EUV lithography based on laser-plasma sources and debris mitigation: Recent developments at ENEA

S. Bollanti, A. Conti, P. Di Lazzaro, F. Flora, L. Mezi, D. Murra, A. Torre, C. Zheng

Research output: Contribution to conferencePaper

Abstract

Within a National Project on nanotechnologies (EUVL-FIRB), aimed at developing the Italian know-how in all aspects of EUV lithography, through the realization at the Frascati ENEA Center of a Micro-Exposure Tool (MET) for EUVL with a <100nm resolution, an EUV-Soft X-ray laser plasma source has been realized and a composite Debris Mitigation System (DMS) has been designed and partly implemented. Both the source and the DMS are shortly described.
Original languageEnglish
Publication statusPublished - 2007
Externally publishedYes
Event34th European Physical Society Conference on Plasma Physics 2007, EPS 2007 - , Poland
Duration: 1 Jan 2007 → …

Conference

Conference34th European Physical Society Conference on Plasma Physics 2007, EPS 2007
CountryPoland
Period1/1/07 → …

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All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

Cite this

Bollanti, S., Conti, A., Di Lazzaro, P., Flora, F., Mezi, L., Murra, D., ... Zheng, C. (2007). EUV lithography based on laser-plasma sources and debris mitigation: Recent developments at ENEA. Paper presented at 34th European Physical Society Conference on Plasma Physics 2007, EPS 2007, Poland.