Excimer-laser-driven EUV plasma source for single-shot projection lithography

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Abstract

We present a low-cost microexposure tool for projection lithography at 14.4 nm we have designed and operated at the ENEA Research Centre, Frascati. It is a laboratory-scale system based on a Schwarzschild-type projection optics which uses a laser-plasma soft X-ray source, equipped with a patented debris mitigation system in order to preserve the collector optics. As a preliminary result, we achieved a 90-nm optical resolution patterning on commercial resist. A sharp improvement in resolution size is expected when operating this tool by a large-output energy excimer laser in order to obtain a single-shot patterning. © 2009 IEEE.
Original languageEnglish
Pages (from-to)475 - 480
Number of pages6
JournalIEEE Transactions on Plasma Science
Volume37
Issue number4 PART 1
DOIs
Publication statusPublished - 2009
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Nuclear and High Energy Physics

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