Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation

Guiseppe Dattoli, Andrea Doria, Gian Piero Gallerano, Luca Giannessi, Klaus Hesch, Herbert O. Moser, Pier Luigi Ottaviani, Eric Pellegrin, Robert Rossmanith, Ralph Steininger, Volker Saile, Jürgen Wüst

Research output: Contribution to journalArticle

19 Citations (Scopus)


The study presented here was initiated by a discussion to investigate the possibility of using synchrotron radiation as a source for the Next Generation Lithography (NGL) based on the EUV-concept (Extreme Ultra-Violet; here 13.5 or 11.3nm radiation, respectively). The requirements are: 50 W, 2%, bandwidth and minimal power outside this bandwidth. Three options were investigated. The first two deal with radiation from bending magnets and undulators. The results confirm the earlier work by Oxfords Instrument and others that these light sources lack in-band power while emitting excessive out-of-band radiation. The third approach is a Free Electron Laser (FEL) driven by a 500MeV linear accelerator with a superconducting mini-undulator as radiation emitting device. Such as device would produce in-band EUV-power in excess of 50W with negligible out-of-band power. © 2001 Elsevier Science B.V. All rights reserved.
Original languageEnglish
Pages (from-to)259 - 272
Number of pages14
JournalNuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Issue number3
Publication statusPublished - 11 Dec 2001
Externally publishedYes


All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Instrumentation

Cite this