Fabrication of 5 nm resolution electrodes for molecular devices by means of electron beam lithography

Enzo Di Fabrizio, Luca Grella, Massimo Gentili, Marco Baciocchi, Luigi Mastrogiacomo, Piero Morales

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Abstract

Electron beam lithography is used to fabricate two-metal electrode tip-shaped structures. The distance between the tips is continuously controlled to be between 5 and 70 nm. The electron beam lithography process is robust and the tip separation is well controlled in the sense that the smallest distance between the tips is a consequence of the design and not a consequence of randomly distributed metal spots around the tip area. Interest in these structures is due to the fact that they can be used to fabricate rectifiers, working with single molecule, designed to exhibit semiconductor properties.
Original languageEnglish
Pages (from-to)-
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume36
Issue number1 PART A/B
Publication statusPublished - 15 Jan 1997
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

Di Fabrizio, E., Grella, L., Gentili, M., Baciocchi, M., Mastrogiacomo, L., & Morales, P. (1997). Fabrication of 5 nm resolution electrodes for molecular devices by means of electron beam lithography. Japanese Journal of Applied Physics, Part 2: Letters, 36(1 PART A/B), -.