Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric lithography

L. Ottaviano, F. Bussolotti, S. Piperno, M. Rinaldi, S. Santucci, F. Flora, L. Mezi, P. Dunne, J. Kaiser, A. Reale, A. Ritucci, P. Zuppella

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Abstract

An extremely promising complete nanofabrication process of metallic patterns, to achieve periodic structure resolution well below 100 nm, has been successfully demonstrated. The process includes the EUV patterning encoding on the photoresist and its transfer from the polymer onto a Si substrate using a 46.9 nm table top soft x-ray laser and an interference lithography scheme. After optimizing the PMMA - poly(methyl methacrylate) - preparation thickness and development, by controlling the metal deposition and subsequent liftoff process on the exposed PMMA/SiO2/Si(1 0 0) samples, we have fabricated large arrays of 200 nm spaced nickel strips on Si surfaces. © 2008 IOP Publishing Ltd.
Original languageEnglish
Article number024019
Pages (from-to)-
JournalPlasma Sources Science and Technology
Volume17
Issue number2
DOIs
Publication statusPublished - 1 May 2008
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)
  • Condensed Matter Physics

Cite this

Ottaviano, L., Bussolotti, F., Piperno, S., Rinaldi, M., Santucci, S., Flora, F., ... Zuppella, P. (2008). Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric lithography. Plasma Sources Science and Technology, 17(2), -. [024019]. https://doi.org/10.1088/0963-0252/17/2/024019