Generation of pure, high-density metal-vapor plasma by capillary discharge

S.V. Kukhlevsky, Cs. Vér, J. Kaiser, L. Kozma, L. Palladino, A. Reale, G. Tomassetti, F. Flora, G. Giordano

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Abstract

Generation of pure, metal-vapor plasmas with peak densities above 1019cm-3is reported. The plasma production is based on the explosive ablation of electrode material in the capillary μs discharge. The plasma density is controlled by varying the discharge parameters. High purity and density were achieved by optimizing the electrode configuration, the capillary material, and dimensions. © 1999 American Institute of Physics.
Original languageEnglish
Pages (from-to)2779 - 2781
Number of pages3
JournalApplied Physics Letters
Volume74
Issue number19
DOIs
Publication statusPublished - 10 May 1999
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

Kukhlevsky, S. V., Vér, C., Kaiser, J., Kozma, L., Palladino, L., Reale, A., ... Giordano, G. (1999). Generation of pure, high-density metal-vapor plasma by capillary discharge. Applied Physics Letters, 74(19), 2779 - 2781. https://doi.org/10.1063/1.124011