Influence of deposition conditions for bottom cell on micromorph tandem device performance

Paola Delli Veneri, Lucia V. Mercaldo, Domenico Caputo, Iurie Usatii, Carlo Privato

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We have realized micromorph tandem solar cells on Asahi U-type TCO-covered glass substrates. The intrinsic layers of both amorphous top cell and microcrystalline bottom cell are grown by very high frequency plasma enhanced chemical vapour deposition (VHF-PECVD) at 100 MHz at low substrate temperature (150 °C). For the bottom cell different growth regimes have been explored by changing both chamber pressure and plasma power. The effect of the structural composition of the microcrystalline absorber layer on the electrical parameters of the device has been investigated. High short circuit current density and constant FF in a wide silane concentration range are obtained when using large power to pressure ratio (0.5 W/Pa). However, low open circuit voltage is generally found in this regime. The largest VOCvalues are found at 67 Pa and power to pressure ratio of 0.3 W/Pa, where the highest efficiency (11.1%) is reached. An evaluation of device stability has been done by exposing the tandem solar cells to white light (AM 1.5-like spectrum) for 200 h. © 2008 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)2478 - 2482
Number of pages5
JournalJournal of Non-Crystalline Solids
Issue number19-25
Publication statusPublished - 1 May 2008


All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Materials Chemistry

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