In the last years, zirconium titanate thin films ZrxTi1-xO4(ZT) turned out to have very interesting dielectric properties, which suggests a use in microwave integrated systems. In this work, the synthesis and characterization of ZrxTi1-xO4(ZT) thin films grown via MOCVD are described, giving emphasis to the study of their structural, chemical and physical properties, with relation to the different process parameters applied. All samples analysed by XRD, AFM, SEM and EDS, show a great dependence on substrate temperature and reactor pressure on the kinetic of growth as well as on the chemical, crystallographic, morphological and microstructural features. © 2002 Elsevier Science Ltd. All rights reserved.
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering
Padeletti, G., Viticoli, M., Cusmà, A., Ingo, G. M., Santoni, A., Loreti, S., ... Viticoli, S. (2002). Influence of growth parameters on properties of electroceramic thin films grown via MO-CVD. Materials Science in Semiconductor Processing, 5(2-3), 105 - 114. https://doi.org/10.1016/S1369-8001(02)00090-2