Kinetic of the growth of chemically etched porous silicon

G. Di Francia, A. Citarella

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Abstract

In this communication we report the results of a systematic study on the formation of chemically etched porous silicon. Samples have been fabricated in HF/HNO3-based solutions for various etching times, using different molar concentrations of nitric acid. The growth of the porous layer has been studied by correlating film porosity and thickness to the etching time. Pore formation is shown to be more related to the surface morphology than to the etch characteristics. Preliminary results on photoluminescence measurements show that substrate morphology also play a major role in the luminescent behavior of chemically etched porous silicon. © 1995 American Institute of Physics.
Original languageEnglish
Pages (from-to)3549 - 3551
Number of pages3
JournalJournal of Applied Physics
Volume77
Issue number7
DOIs
Publication statusPublished - 1995

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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