KrF laser deposition combined with magnetron sputtering to grow titanium-carbide layers

M. Jelínek, T. Kocourek, J. Kadlec, V. Vorlíček, M. Čerňanský, V. Studnička, A. Santoni, P. Boháč, F. Uherek

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Abstract

Titanium-carbide films were grown using a magnetron assisted pulse laser deposition combining KrF pulsed laser deposition and DC magnetron sputtering (PLDMS). Plasma streams produced by magnetron and laser ablation were intersected on the substrate surface. Films' properties were characterized by GDOES, AFM, XRD, XPS as well as by Raman spectroscopy. The adhesion and microhardness were also studied. Crystalline TiC films were fabricated at room temperature. © 2005 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)101 - 105
Number of pages5
JournalThin Solid Films
Volume506-507
DOIs
Publication statusPublished - 26 May 2006
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Jelínek, M., Kocourek, T., Kadlec, J., Vorlíček, V., Čerňanský, M., Studnička, V., ... Uherek, F. (2006). KrF laser deposition combined with magnetron sputtering to grow titanium-carbide layers. Thin Solid Films, 506-507, 101 - 105. https://doi.org/10.1016/j.tsf.2005.08.040