Titanium-carbide films were grown using a magnetron assisted pulse laser deposition combining KrF pulsed laser deposition and DC magnetron sputtering (PLDMS). Plasma streams produced by magnetron and laser ablation were intersected on the substrate surface. Films' properties were characterized by GDOES, AFM, XRD, XPS as well as by Raman spectroscopy. The adhesion and microhardness were also studied. Crystalline TiC films were fabricated at room temperature. © 2005 Elsevier B.V. All rights reserved.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry
Jelínek, M., Kocourek, T., Kadlec, J., Vorlíček, V., Čerňanský, M., Studnička, V., ... Uherek, F. (2006). KrF laser deposition combined with magnetron sputtering to grow titanium-carbide layers. Thin Solid Films, 506-507, 101 - 105. https://doi.org/10.1016/j.tsf.2005.08.040