A preliminary theoretical and experimental demonstration of the successful use of krypton as stopper for ions and small debris (Φ < 1 μm) in laser plasma sources is discussed. In particular, for applications to projection micro-lithography at hv = 60-90 eV, an ions rejection by almost 2 orders of magnitude is obtained at a Kr pressure compatible for more than 80% transmission of the EUV radiation.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)
Flora, F., Mezi, L., Zheng, C. E., & Bonfigli, F. (2001). Krypton as stopper for ions and small debris in laser plasma sources. Europhysics Letters, 56(5), 676 - 682. https://doi.org/10.1209/epl/i2001-00573-x