Krypton as stopper for ions and small debris in laser plasma sources

F. Flora, L. Mezi, C.E. Zheng, F. Bonfigli

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A preliminary theoretical and experimental demonstration of the successful use of krypton as stopper for ions and small debris (Φ < 1 μm) in laser plasma sources is discussed. In particular, for applications to projection micro-lithography at hv = 60-90 eV, an ions rejection by almost 2 orders of magnitude is obtained at a Kr pressure compatible for more than 80% transmission of the EUV radiation.
Original languageEnglish
Pages (from-to)676 - 682
Number of pages7
JournalEurophysics Letters
Issue number5
Publication statusPublished - 1 Dec 2001
Externally publishedYes


All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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