Laser irradiation, ion implantation and e-beam writing of integrated optical structures

G.C. Righini, I. Banyasz, S. Berneschi, M. Brenci, A. Chiasera, M. Cremona, D. Ehrt, M. Ferrari, R.M. Montereali, G. Nunzi Conti, S. Pelli, S. Sebastiani, C. Tosello

Research output: Contribution to conferencePaper

17 Citations (Scopus)

Abstract

Much attention is currently being paid to the materials and processes that allow one to directly write or to imprint waveguiding structures and/or diffractive elements for optical integrated circuits by exposure from a source of photons, electrons or ions. Here a brief overview of the results achieved in our laboratories is presented, concerning the fabrication and characterization of optical guiding structures based on different materials and exposure techniques. These approaches include: electron and ion beam writing of waveguides in (poly)-crystalline lithium fluoride. uv-laser printing of waveguides and gratings in photorefractive glass thin films, and fs-laser writing in tellurite glasses. Properties and perspectives of these approaches are also discussed.
Original languageEnglish
DOIs
Publication statusPublished - 2005
Externally publishedYes
EventPhotonic Materials, Devices, and Applications - , Spain
Duration: 1 Jan 2005 → …

Conference

ConferencePhotonic Materials, Devices, and Applications
CountrySpain
Period1/1/05 → …

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Righini, G. C., Banyasz, I., Berneschi, S., Brenci, M., Chiasera, A., Cremona, M., ... Tosello, C. (2005). Laser irradiation, ion implantation and e-beam writing of integrated optical structures. Paper presented at Photonic Materials, Devices, and Applications, Spain. https://doi.org/10.1117/12.609231