Debris mitigation is still a critical issue for the development of extreme ultraviolet projection lithography (EUVL). Here, we describe the analysis of the efficiency of the debris-mitigation system (DMS) presently in use in the laser-plasma-source micro-exposure tool (MET) operating at the Frascati ENEA Research Center. Basic to such an analysis is a code specifically developed for processing the images of debris-flux-exposed glass slides. The code stands out as a tool for further plasma debris-related analyses. © 2009 Springer-Verlag.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)
- Physics and Astronomy(all)
Bollanti, S., Di Lazzaro, P., Flora, F., Mezi, L., Murra, D., & Torre, A. (2009). Laser-plasma-source debris-related investigations: An aspect of the ENEA micro-exposure tool. Applied Physics B: Lasers and Optics, 96(2-3), 479 - 490. https://doi.org/10.1007/s00340-009-3583-z