Laser-plasma-source debris-related investigations: An aspect of the ENEA micro-exposure tool

S. Bollanti, P. Di Lazzaro, F. Flora, L. Mezi, D. Murra, A. Torre

Research output: Contribution to journalArticle

6 Citations (Scopus)


Debris mitigation is still a critical issue for the development of extreme ultraviolet projection lithography (EUVL). Here, we describe the analysis of the efficiency of the debris-mitigation system (DMS) presently in use in the laser-plasma-source micro-exposure tool (MET) operating at the Frascati ENEA Research Center. Basic to such an analysis is a code specifically developed for processing the images of debris-flux-exposed glass slides. The code stands out as a tool for further plasma debris-related analyses. © 2009 Springer-Verlag.
Original languageEnglish
Pages (from-to)479 - 490
Number of pages12
JournalApplied Physics B: Lasers and Optics
Issue number2-3
Publication statusPublished - Aug 2009
Externally publishedYes


All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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