Thin films of boron nitride are produced by means of r.f. unbalanced magnetron sputtering using a pyrolytic boron nitride target. Different sputtering parameters such as target-to-sample distance, magnetic field and total discharge pressure are investigated. The study of the film microstructure is performed by means of FT-IR and by glancing angle X-ray diffraction. The film stoichiometry is determined by using nuclear techniques such as Rutherford back-scattering spectrometry, elastic recoil detection, (p,α) and (d,p) nuclear reactions. The collected data are discussed and related to the film micro structure by structural modelling. © 1997 Elsevier Science S.A.
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry