Microstructure and physical properties of B

V. Rigato, M. Spolaore, F. Giorgis, L.E. Depero, L. Sangaletti, P. Colombo

Research output: Contribution to journalArticle


Thin films of boron nitride are produced by means of r.f. unbalanced magnetron sputtering using a pyrolytic boron nitride target. Different sputtering parameters such as target-to-sample distance, magnetic field and total discharge pressure are investigated. The study of the film microstructure is performed by means of FT-IR and by glancing angle X-ray diffraction. The film stoichiometry is determined by using nuclear techniques such as Rutherford back-scattering spectrometry, elastic recoil detection, (p,α) and (d,p) nuclear reactions. The collected data are discussed and related to the film micro structure by structural modelling. © 1997 Elsevier Science S.A.
Original languageEnglish
Pages (from-to)582 - 589
Number of pages8
JournalSurface and Coatings Technology
Issue number1-3
Publication statusPublished - 1997
Externally publishedYes


All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Rigato, V., Spolaore, M., Giorgis, F., Depero, L. E., Sangaletti, L., & Colombo, P. (1997). Microstructure and physical properties of B. Surface and Coatings Technology, 97(1-3), 582 - 589. https://doi.org/10.1016/S0257-8972(97)00378-2