Miniaturized optical devices produced by electron beam lithography in lithium fluoride films

R.M. Montereali

Research output: Contribution to conferencePaper

Abstract

The use of versatile, well-Assessed and low-cost fabrication techniques consisting in physical vapor deposition of LiF films combined with an electron-beam direct writing lithographic process allows the realization of optically confined active structures, like broad-band emitters, channel waveguides and optical microcavities operating in the visible.
Original languageEnglish
DOIs
Publication statusPublished - 7 Apr 2000
Externally publishedYes
Event6th Regional Conference on Nuclear and Condensed Matter Physics - Palermo, Italy
Duration: 7 Apr 2000 → …

Conference

Conference6th Regional Conference on Nuclear and Condensed Matter Physics
CountryItaly
CityPalermo
Period7/4/00 → …

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Montereali, R. M. (2000). Miniaturized optical devices produced by electron beam lithography in lithium fluoride films. Paper presented at 6th Regional Conference on Nuclear and Condensed Matter Physics, Palermo, Italy. https://doi.org/10.1063/1.1303357