A 3D analytical model of calculation has been carried out to simulate the heat effects induced during ion beam assisted thin film deposition. The irradiation conditions enabling the growth of the film under steady conditions of temperature are discussed. Some results are presented to show the computer simulation of possible surface processing conditions.
|Publication status||Published - 1995|
|Event||Proceedings of the Spring Meeting on MRS - , Unknown|
Duration: 1 Jan 1995 → …
|Conference||Proceedings of the Spring Meeting on MRS|
|Period||1/1/95 → …|
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials