Modeling and computer simulation of the thermal field induced by ion beam irradiation of bilayers

Tosto Sebastiano

Research output: Contribution to conferencePaper

Abstract

A 3D analytical model of calculation has been carried out to simulate the heat effects induced during ion beam assisted thin film deposition. The irradiation conditions enabling the growth of the film under steady conditions of temperature are discussed. Some results are presented to show the computer simulation of possible surface processing conditions.
Original languageEnglish
Publication statusPublished - 1995
Externally publishedYes
EventProceedings of the Spring Meeting on MRS - , Unknown
Duration: 1 Jan 1995 → …

Conference

ConferenceProceedings of the Spring Meeting on MRS
CountryUnknown
Period1/1/95 → …

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

Cite this

Sebastiano, T. (1995). Modeling and computer simulation of the thermal field induced by ion beam irradiation of bilayers. Paper presented at Proceedings of the Spring Meeting on MRS, Unknown.