On the growth of LiF films by Pulsed Laser Deposition

A. Perea, J. Gonzalo, C.N. Afonso, S. Martelli, R.M. Montereali

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Abstract

The production of Lithium fluoride (LiF) films by Pulsed Laser Deposition is reported for the first time. The influence of several deposition parameters such as the laser energy density, the presence of a gas pressure (10-1mbar of He) and the substrate temperature on the film quality is studied by using in-situ reflectivity measurements, Scanning Electron Microscopy and X-ray diffraction. Films deposited in vacuum are polycrystalline and fully textured along the (100) orientation, whereas those grown in He pressure present a more complicated structure. Films are generally rough, the roughness decreasing as the substrate temperature increases or the laser energy density decreases. The origin of this roughness is discussed in terms of the ablation mechanism taking place at the target. © 1999 Elsevier Science B.V. All rights reserved.
Original languageEnglish
Pages (from-to)533 - 537
Number of pages5
JournalApplied Surface Science
Volume138-139
Issue number1-4
DOIs
Publication statusPublished - 1999
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films

Cite this

Perea, A., Gonzalo, J., Afonso, C. N., Martelli, S., & Montereali, R. M. (1999). On the growth of LiF films by Pulsed Laser Deposition. Applied Surface Science, 138-139(1-4), 533 - 537. https://doi.org/10.1016/S0169-4332(98)00449-8