One-step in-diffusion as a result of multipulse laser irradiation of linbo

A. Ferrari, L. Schirone, G. Maiello, C. De Cesare, F. Carassitti, M. Bertolotti, M.A. Caponero, A. Luches, M. Martino, M. Dinescu, N. Chitica, I.N. Mihailescu, I. Ursu

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Abstract

We studied Ti in-diffusion as an effect of multipulse laser irradiation, in either visible of ultraviolet (u.v.) spectral ranges, of LiNbO3singlecrystalline structures with Ti coatings of two different thicknesses. It is shown that while u.v. (excimer, λ ≈ 308 nm) laser irradiation causes a complete expulsion of the Ti deposit, the visible (ruby, λ ≈ 694. 3 nm) laser irradiation at intermediate incident laser fluence (up to ≈ 0. 7 J cm-2) promotes efficient Ti in-diffusion from the thin (400 Å. width) Ti deposit down to a micrometre range implantation depth. © 1993 Taylor and Francis Ltd.
Original languageEnglish
Pages (from-to)1043 - 1052
Number of pages10
JournalJournal of Modern Optics
Volume40
Issue number6
DOIs
Publication statusPublished - 1 Jun 1993
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

Cite this

Ferrari, A., Schirone, L., Maiello, G., De Cesare, C., Carassitti, F., Bertolotti, M., ... Ursu, I. (1993). One-step in-diffusion as a result of multipulse laser irradiation of linbo. Journal of Modern Optics, 40(6), 1043 - 1052. https://doi.org/10.1080/09500349314551121