We studied Ti in-diffusion as an effect of multipulse laser irradiation, in either visible of ultraviolet (u.v.) spectral ranges, of LiNbO3singlecrystalline structures with Ti coatings of two different thicknesses. It is shown that while u.v. (excimer, λ ≈ 308 nm) laser irradiation causes a complete expulsion of the Ti deposit, the visible (ruby, λ ≈ 694. 3 nm) laser irradiation at intermediate incident laser fluence (up to ≈ 0. 7 J cm-2) promotes efficient Ti in-diffusion from the thin (400 Å. width) Ti deposit down to a micrometre range implantation depth. © 1993 Taylor and Francis Ltd.
All Science Journal Classification (ASJC) codes
- Atomic and Molecular Physics, and Optics
Ferrari, A., Schirone, L., Maiello, G., De Cesare, C., Carassitti, F., Bertolotti, M., ... Ursu, I. (1993). One-step in-diffusion as a result of multipulse laser irradiation of linbo. Journal of Modern Optics, 40(6), 1043 - 1052. https://doi.org/10.1080/09500349314551121