Photoelectron diffraction study of the low-temperature low-coverage oxygen layer on Rh(110)

Federica Bondino, Giovanni Comelli, Alessandro Baraldi, Renzo Rosei, Silvano Lizzit, Andrea Goldoni, Rosanna Larciprete, Giorgio Paolucci

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Abstract

The local adsorption geometry of the low-coverage, short-range-ordered layer formed upon oxygen adsorption on the Rh(110) surface at 120 K has been quantitatively characterized by photoelectron diffraction measurements and multiple-scattering cluster calculations. The results of the structural analysis are compatible with a model where the oxygen atoms are located in the symmetric or slightly asymmetric short-bridge sites of the unreconstructed Rh(110) surface. O adsorption induces a small increase of the first substrate interlayer distance with respect to the relaxation of the clean Rh(110) surface.
Original languageEnglish
Article number075402
Pages (from-to)754021 - 754025
Number of pages5
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume66
Issue number7
DOIs
Publication statusPublished - 15 Aug 2002
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Bondino, F., Comelli, G., Baraldi, A., Rosei, R., Lizzit, S., Goldoni, A., ... Paolucci, G. (2002). Photoelectron diffraction study of the low-temperature low-coverage oxygen layer on Rh(110). Physical Review B - Condensed Matter and Materials Physics, 66(7), 754021 - 754025. [075402]. https://doi.org/10.1103/PhysRevB.66.075402