Point defects in lithium fluoride by EUV and soft X-rays exposure for X-ray microscopy and optical applications

Giuseppe Baldacchini, Sarah Bollanti, Francesca Bonfigli, Paolo Di Lazzaro, Anatoly Ya. Faenov, Francesco Flora, Tiziana Marolo, Rosa Maria Montereali, Daniele Murra, Enrico Nichelatti, Tatiana Pikuz, Armando Reale, Lucia Reale, Antonio Ritucci, Giuseppe Tomassetti

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

The extreme ultraviolet radiation emitted by a laser-plasma source or by a capillary discharge laser is applied to the generation of luminescent patterns in lithium fluoride. This novel technique is able to produce colored patterns with high spatial resolution on large (more than 10 cm2) areas in a short exposure time compared with other irradiation methods like the electron beam writing. The potentials of this technique for applications in photonics are commented. This paper reviews the activity performed during the past four years at the ENEA Frascati Center and at L'Aquila University, Italy. Preliminary images of microradiography or X-ray contact microscopy using lithium fluoride as an imaging detector are presented. The advantages of this new detector compared with photographic films or with photoresists are discussed.
Original languageEnglish
Pages (from-to)1435 - 1445
Number of pages11
JournalIEEE Journal on Selected Topics in Quantum Electronics
Volume10
Issue number6
DOIs
Publication statusPublished - Nov 2004
Externally publishedYes

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this