Process development of amorphous silicon/crystalline silicon solar cells

F. Roca, G. Sinno, G. Di Francia, P. Prosini, G. Fameli, P. Grillo, A. Citarella, F. Pascarella, D. Della Sala

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

We have already investigated some crucial limiting process steps of the amorphous silicon (a-Si)/crystalline silicon (c-Si) solar cell technology and some specific characterization tools of the ultrathin amorphous material used in devices. In this work, we focus our attention particularly on the technology of the ITO front contact fabrication, that also is used as an antireflective coating. It is pointed out that this layer acts as a barrier layer against the diffusion of metal during the annealing treatments of the front contact grid. The criteria of the selection of the metal to be used to obtain good performance of the grid and the deposition methods best suited to the purpose are shown. We were able to fabricate low temperature heterojunction solar cells based p-type Czochralski silicon, and a conversion efficiency of 14.7% on 3.8 cm2area was obtained without back surface field and texturization.
Original languageEnglish
Pages (from-to)15 - 24
Number of pages10
JournalSolar Energy Materials and Solar Cells
Volume48
Issue number1-4
DOIs
Publication statusPublished - 1997

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films

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