Redistribution and electrical activation of ultralow energy implanted boron in silicon following laser annealing

S. Whelan, V. Privitera, M. Italia, G. Mannino, C. Bongiorno, C. Spinella, G. Fortunato, L. Mariucci, M. Stanizzi, A. Mittiga

Research output: Contribution to journalArticle

34 Citations (Scopus)
Original languageEnglish
Pages (from-to)644 - 649
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number2
DOIs
Publication statusPublished - Mar 2002

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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