Site of Er ions in Er-implanted silica containing Si nanoclusters

C. Maurizio, F. D'Acapito, F. Priolo, G. Franzò, F. Iacona, E. Borsella, S. Padovani, P. Mazzoldi

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Abstract

In this work the site of Er ions in a silica matrix containing Si nanoclusters (nc) is investigated. The Er ions are introduced into a silica matrix containing Si nanoclusters by ion implantation. The X-ray absorption spectroscopy (EXAFS), performed at Er LIII-edge shows that the Er site in the matrix strongly depends on the preparation conditions; the effect of the implantation dose on the local structure around Er is addressed. The data demonstrate that the Er atoms are surrounded in the first shell by O atoms. Moreover, an increasing in the Er implantation dose implies an increase of the number of O atoms in the first shell and of their distance to the Er central atom, leading to the formation of a Er site more similar to that of bulk Er2O3. © 2004 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)900 - 903
Number of pages4
JournalOptical Materials
Volume27
Issue number5
DOIs
Publication statusPublished - Feb 2005
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

Cite this

Maurizio, C., D'Acapito, F., Priolo, F., Franzò, G., Iacona, F., Borsella, E., ... Mazzoldi, P. (2005). Site of Er ions in Er-implanted silica containing Si nanoclusters. Optical Materials, 27(5), 900 - 903. https://doi.org/10.1016/j.optmat.2004.08.032