Spectral enhancement of a Xe-based EUV discharge plasma source

P. Zuppella, A. Reale, A. Ritucci, P. Tucceri, S. Prezioso, F. Flora, L. Mezi, P. Dunne

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Abstract

Spectra have been recorded from a Xe discharge capillary source in the extreme ultraviolet (EUV) region of the spectrum, between 10 and 18 nm. Features due to 4d-4f and 4d-5p transitions in a range of ions have been observed, with the 4d-4f emission from ions Xe 8+-Xe 12+ clearly identified in the spectrum. The power emitted into a range of bands in the EUV has been measured and the effects on the spectrum of adding SnO 2 and In 2O 3 powders to the Xe discharge have been quantified. The influence of indium ions on the spectrum, in particular, is to increase the emission in the region of 14.3 nm by as much as 30% over the pure xenon spectrum. © 2009 IOP Publishing Ltd.
Original languageEnglish
Article number025014
Pages (from-to)-
JournalPlasma Sources Science and Technology
Volume18
Issue number2
DOIs
Publication statusPublished - 2009
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

Cite this

Zuppella, P., Reale, A., Ritucci, A., Tucceri, P., Prezioso, S., Flora, F., ... Dunne, P. (2009). Spectral enhancement of a Xe-based EUV discharge plasma source. Plasma Sources Science and Technology, 18(2), -. [025014]. https://doi.org/10.1088/0963-0252/18/2/025014