Spectroscopic ellipsometry study of interfaces and crystallization behavior during annealing of a-Si:H films

M. Losurdo, F. Roca, R. De Rosa, P. Capezzuto, G. Bruno

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Abstract

Spectroscopic ellipsometry is used to investigate the subsurface reactions related to hydrogen diffusion during the annealing process at temperatures ranging from 250 °C to 650 °C of very thin a-Si:H films in stacked structures. A gradual and partial crystallization of the a-Si film develops from both the substrate and the top surface layers depending on annealing time. The SE approach is also applied to the characterization and optimization of the annealing process of ITO/a-Si:H/c-Si heterostructures for solar cells application. The effects of the annealing process on the a-Si:H microstructural modification and on the optical properties of the indium tin oxide (ITO) layer are deduced.
Original languageEnglish
Pages (from-to)69 - 72
Number of pages4
JournalThin Solid Films
Volume383
Issue number1-2
DOIs
Publication statusPublished - 15 Feb 2001

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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