Structural properties of RF-magnetron sputtered Cu

C.L. Azanza Ricardo, M. D'Incau, M. Leoni, C. Malerba, A. Mittiga, P. Scardi

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Cuprous oxide thin films were produced on soda-lime glass substrates using reactive RF-magnetron sputtering. The influence of deposition parameters and temperature on composition and structural properties of the single layers was extensively studied using X-ray diffraction. The control over microstructure and residual stresses is possible by changing reactive gas pressure and deposition temperature. Fiber textured Cu2O films showing a [100] preferred orientation and a fraction of untextured domains can be obtained: suitable modeling taking this microstructure into account shows the presence of a strong compressive stress decreasing with the temperature. Highly reproducible films can be obtained, whose microstructure is preserved when sputtering on tungsten and zinc oxide substrates. © 2011 Elsevier B.V.
Original languageEnglish
Pages (from-to)280 - 286
Number of pages7
JournalThin Solid Films
Issue number1
Publication statusPublished - 31 Oct 2011


All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Azanza Ricardo, C. L., D'Incau, M., Leoni, M., Malerba, C., Mittiga, A., & Scardi, P. (2011). Structural properties of RF-magnetron sputtered Cu. Thin Solid Films, 520(1), 280 - 286.