The ENEA discharge produced plasma EUV source: Description and applications

L. Mezi, S. Bollanti, L. Businaro, P. Di Lazzaro, A. Gerardino, F. Flora, D. Murra, A. Torre

Research output: Contribution to conferencePaper

Abstract

After a brief description of the extreme ultraviolet (EUV) radiation peculiarities, the main characteristics of the ENEA Discharge Produced Plasma (DPP) EUV source are described. An efficient debris mitigation system has been developed and tested on the DPP source, to protect delicate objects from plasma emitted debris bombardment. The DPP source has been successfully utilized for pattern generation by EUV irradiation of photonic materials like lithium fluoride crystals and various innovative photoresists. A simple contact EUV lithography technique has been demonstrated to be effective for sub-micrometric resolution patterning on the above mentioned materials. Examples of obtained patterns are presented and discussed.
Original languageEnglish
Publication statusPublished - 2016
Externally publishedYes
Event18th Italian National Conference on Photonic Technologies, Fotonica 2016 - Rome, Italy
Duration: 1 Jan 2016 → …

Conference

Conference18th Italian National Conference on Photonic Technologies, Fotonica 2016
CountryItaly
CityRome
Period1/1/16 → …

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All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

Cite this

Mezi, L., Bollanti, S., Businaro, L., Di Lazzaro, P., Gerardino, A., Flora, F., ... Torre, A. (2016). The ENEA discharge produced plasma EUV source: Description and applications. Paper presented at 18th Italian National Conference on Photonic Technologies, Fotonica 2016, Rome, Italy.