The first italian micro exposure tool for EUV lithography: Design guidelines and experimental results

F. Flora, S. Bollanti, P. Di Lazzaro, L. Mezi, D. Murra, A. Tone

Research output: Contribution to conferencePaper

Abstract

The first Italian Micro Exposure Tool (MET) for EUV lithography has been developed at the ENEA Research Laboratories in Frascati. This tool (named MET-EGERIA) is based on a laser-plasma EUV source (named EGERIA), a couple of twin grazing-incidence collectors and a non-conventional Schwarzschild optics. In spite of the very low cost of the Schwarzschild optics, the specific design of the low vibration board and the innovative alignment technique (a modified Foucault technique) applied to the Schwarzschild optics allowed the achievement of a resolution better than 100 nm on a wafer coated with a PMMA photoresist. The MET-EGER1A is also suitable for the coloration of lithium fluoride to be used in photonics, and is also a promising tool for nanobiotechnological research.
Original languageEnglish
Publication statusPublished - 2009
Externally publishedYes
EventNanotechnology 2009: Fabrication, Particles, Characterization, MEMS, Electronics and Photonics - 2009 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2009 - , United States
Duration: 1 Jan 2009 → …

Conference

ConferenceNanotechnology 2009: Fabrication, Particles, Characterization, MEMS, Electronics and Photonics - 2009 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2009
CountryUnited States
Period1/1/09 → …

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All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Flora, F., Bollanti, S., Di Lazzaro, P., Mezi, L., Murra, D., & Tone, A. (2009). The first italian micro exposure tool for EUV lithography: Design guidelines and experimental results. Paper presented at Nanotechnology 2009: Fabrication, Particles, Characterization, MEMS, Electronics and Photonics - 2009 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2009, United States.