The vacuum vessel of RFX has a total volume of 10 m3and a surface exposed to the vacuum of 40 m2. It is completely covered with 2016 graphite tiles. The following wall conditioning techniques are applied: baking up to 350°C, GDC and PDC in H2and He. Moreover, in order to reduce Zeffin the plasma discharge, a GDC assisted deposition of a film containing boron has been carried out. The effectiveness is assessed by means of mass spectrometers and by silicon samples exposed to the processes. In this paper, after a brief description of the wall conditioning techniques, the main results are reported and compared. Copyright © 1996 Published by Elsevier Science Ltd.
|Pages (from-to)||977 - 980|
|Number of pages||4|
|Publication status||Published - 1996|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces, Coatings and Films