The wall conditioning techniques in RFX

P. Sonato, W.R. Baker, P. Fiorentin, G. Marchiori, P. Zaccaria, G. Zollino, V. Antoni, M. Bagatin, D. Desideri, G. Serianni, L. Tramontin, R. Bertoncello

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2 Citations (Scopus)


The vacuum vessel of RFX has a total volume of 10 m3and a surface exposed to the vacuum of 40 m2. It is completely covered with 2016 graphite tiles. The following wall conditioning techniques are applied: baking up to 350°C, GDC and PDC in H2and He. Moreover, in order to reduce Zeffin the plasma discharge, a GDC assisted deposition of a film containing boron has been carried out. The effectiveness is assessed by means of mass spectrometers and by silicon samples exposed to the processes. In this paper, after a brief description of the wall conditioning techniques, the main results are reported and compared. Copyright © 1996 Published by Elsevier Science Ltd.
Original languageEnglish
Pages (from-to)977 - 980
Number of pages4
Issue number6-8
Publication statusPublished - 1996
Externally publishedYes


All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this

Sonato, P., Baker, W. R., Fiorentin, P., Marchiori, G., Zaccaria, P., Zollino, G., ... Bertoncello, R. (1996). The wall conditioning techniques in RFX. Vacuum, 47(6-8), 977 - 980.