Thin film silicon photovoltaics: Architectural perspectives and technological issues

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Abstract

Thin film photovoltaics is a particularly attractive technology for building integration. In this paper, we present our analysis on architectural issues and technological developments of thin film silicon photovoltaics. In particular, we focus on our activities related to transparent and conductive oxide (TCO) and thin film amorphous and microcrystalline silicon solar cells. The research on TCO films is mainly dedicated to large-area deposition of zinc oxide (ZnO) by low pressure-metallorganic chemical vapor deposition. ZnO material, with a low sheet resistance (82%) in the whole wavelength range of photovoltaic interest, has been obtained. "Micromorph" tandem devices, consisting of an amorphous silicon top cell and a microcrystalline silicon bottom cell, are fabricated by using the very high frequency plasma enhanced chemical vapor deposition technique. An initial efficiency of 11.1% (>10% stabilized) has been obtained. © 2008 Elsevier Ltd. All rights reserved.
Original languageEnglish
Pages (from-to)1836 - 1844
Number of pages9
JournalApplied Energy
Volume86
Issue number10
DOIs
Publication statusPublished - 2009

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All Science Journal Classification (ASJC) codes

  • Building and Construction
  • Energy(all)
  • Mechanical Engineering
  • Management, Monitoring, Policy and Law

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