We present the exciting results obtained by using a natural (i.e. as long as the active medium gain) 120-ns-duration excimer laser pulse focused on relatively thick targets (100 μm): a conversion efficiency exceeding 20% has been obtained in the 40-70 eV (170-300 angstroms) spectral interval from Cu and Ta targets, with more than 100-ns-FWHM X-ray pulses and low speed (<100 m/s) emitted debris. A fast CCD camera is used to reveal the debris and to measure their speed for different laser parameters. These values of debris speed are compatible with the use of a mechanical device to separate them from the X-ray beam and hence to protect the optics of a projection-microlithography system.
|Publication status||Published - 1999|
|Event||Proceedings of the 1999 EUV, X-Ray, and Neutron Optics and Sources - , Unknown|
Duration: 1 Jan 1999 → …
|Conference||Proceedings of the 1999 EUV, X-Ray, and Neutron Optics and Sources|
|Period||1/1/99 → …|
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering
- Condensed Matter Physics
Bollanti, S., Di Lazzaro, P., Flora, F., Letardi, T., Marinai, A., Nottola, A., ... Zheng, C. E. (1999). Toward a high average power and debris free soft X-ray source for microlithography, pumped by a long pulse excimer laser. Paper presented at Proceedings of the 1999 EUV, X-Ray, and Neutron Optics and Sources, Unknown.