Toward a high average power and debris free soft X-ray source for microlithography, pumped by a long pulse excimer laser

S. Bollanti, P. Di Lazzaro, F. Flora, T. Letardi, A. Marinai, A. Nottola, K. Vigli-Papadaki, A. Vitali, F. Bonfigli, N. Lisi, L. Palladino, A. Reale, C.E. Zheng

Research output: Contribution to conferencePaper

4 Citations (Scopus)

Abstract

We present the exciting results obtained by using a natural (i.e. as long as the active medium gain) 120-ns-duration excimer laser pulse focused on relatively thick targets (100 μm): a conversion efficiency exceeding 20% has been obtained in the 40-70 eV (170-300 angstroms) spectral interval from Cu and Ta targets, with more than 100-ns-FWHM X-ray pulses and low speed (<100 m/s) emitted debris. A fast CCD camera is used to reveal the debris and to measure their speed for different laser parameters. These values of debris speed are compatible with the use of a mechanical device to separate them from the X-ray beam and hence to protect the optics of a projection-microlithography system.
Original languageEnglish
Publication statusPublished - 1999
EventProceedings of the 1999 EUV, X-Ray, and Neutron Optics and Sources - , Unknown
Duration: 1 Jan 1999 → …

Conference

ConferenceProceedings of the 1999 EUV, X-Ray, and Neutron Optics and Sources
CountryUnknown
Period1/1/99 → …

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All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Bollanti, S., Di Lazzaro, P., Flora, F., Letardi, T., Marinai, A., Nottola, A., ... Zheng, C. E. (1999). Toward a high average power and debris free soft X-ray source for microlithography, pumped by a long pulse excimer laser. Paper presented at Proceedings of the 1999 EUV, X-Ray, and Neutron Optics and Sources, Unknown.